Influence of nitrogen doping on thermal stability of fluorinated amorphous carbon thin films
thin films、amorphous carbon、thermal stability、chemical vapor deposition、structure of the films、radio frequency plasma、in order
16
TG1(金属学与热处理)
2006-04-13(万方平台首次上网日期,不代表论文的发表时间)
共5页
54-58