Corrosion electrochemical mechanism of chemical mechanical polishing of copper in K3Fe(CN)6 solution
copper in、corrosion current density、polishing rate、passive film、slurry system
12
O69;O646.6(应用化学)
Science Fund of National Preeminent Youth59925412;Science and Technology Fund of Excellect Mid-youth of Hunan Province98JZY2167
2004-01-08(万方平台首次上网日期,不代表论文的发表时间)
共5页
178-182