Deposition and Characterization of (Ba, Sr)RuO3 Oxide Electrode Using TMHD-Based Single Cocktail Source
flow rate、chemical vapor deposition、chemical composition、phase formation、feeding rate、oxide film、mass flow、Si wafer
22
TG175;O471.4(金属学与热处理)
Project supped by the Korea Institute of Science and Technology Evaluation and Planning KISTEP through the National Research Laboratory NRL program in the year of 2002
2005-09-08(万方平台首次上网日期,不代表论文的发表时间)
共5页
8-12