Facile and robust strategy to antireflective photo-curing coating through self-wrinkling
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The authors thank the National Natural Science Foundation of China.21522403,51373098;the National Basic Research Program2013CB834506;Education Commission of Shanghai Municipal Government15SG13;IFPM 2016B002 of Shanghai Jiao Tong University & Affiliated Sixth People”s Hospital South Campus for their financial support
2018-03-02(万方平台首次上网日期,不代表论文的发表时间)
共4页
2147-2150