Low-k integration: Gas screening for cryogenic etching and plasma damage mitigation
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The authors acknowledge Dr.P.Shen and K.Urabe from Air Liquide Laboratories for providing HBPO,Sumida,Mikado and Akita molecules.This project has received funding from the European Union”s Horizon 2020 research and innovation program under the Marie Sklodowska-Curie grant agreement No.708106
2019-09-25(万方平台首次上网日期,不代表论文的发表时间)
共6页
511-516