A facile and non-destructive quartz fiber shadow mask process for the sub-micrometer device fabrication on two-dimensional semiconductors
The normal fabrication process for electronic and opto-electronic devices can bring in significant modifications on two-dimensional (2D) semiconductors' intrinsic properties.To address this issue,some dry methods have been developed,such as "transfer contact" method and "shadow mask technology".However,the method that can combine the advantages of low cost,non-destruction,and high reliability at sub-micrometer scale is rarely reported.Here,we demonstrate a fabrication technique using ultrafine quartz fibers as shadow masks.
41
2022-03-25（万方平台首次上网日期，不代表论文的发表时间）
共6页
319-324
