Deposition of TiN/TiAlN multilayers by plasma-activated EB-PVD: tailored microstructure by jumping beam technology
plastic deformation、multilayer coatings、electron beam、deposition process、columnar structure、plasma activation、cathode plasma
36
TB3;O6
This study was financially supported by the National Natural Science Foundations of China .51201005 and 51231001
2017-10-20(万方平台首次上网日期,不代表论文的发表时间)
共8页
651-658