Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD

机标关键词：MOCVD

所属期刊栏目：31

资助基金：the National Natural Science Foundation of China61040058;60976006;the Fundamental Research Funds for the Central UniversitiesDUT10LK01;the Science and Technology Foundation for Higher Education of Liaoning Province, China and Science and Technology Innovation Project Foundation for Higher Education School707015

在线出版日期：2012-07-03（万方平台首次上网日期，不代表论文的发表时间）

页数：共4页

页码：150-153