Growth of HT-LiCoO2 thin films on Pt-metalized silicon substrates
substrate temperature、oxygen pressure、pulsed laser deposition、structural stability、discharge capacity、average grain size、surface roughness、lithium insertion、thin film
27
TN3;TB3
This work was financially supported by the CERG Competitive Earmarked Research Grant grant from Research Grants Council of the Hong Kong Special Administrative Region,ChinaCityU 1316/03E;the National Natural Science Foundation of China50401015;the Program of the Ministry of Education of China for Changjiang Scholars and Innovative Research Team in UniversitiesIRT 0551;the Natural Science Foundation of Guangdong Province,China under the Team Project
2008-09-01(万方平台首次上网日期,不代表论文的发表时间)
共7页
266-272