Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
thin films、refractive index、room temperature、roughness value、radio frequency、indium oxide、gas pressure、mole ratio、flow rate
25
TG146(金属学与热处理)
the National Defence Science Council of China5141002040JW0504;the Excellent Ph.D Thesis Foundation of Huazhong University of Science and TechnologyHUST2004-39
2006-09-19(万方平台首次上网日期,不代表论文的发表时间)
共6页
359-364