BE-PLUS: a new base editing tool with broadened editing window and enhanced fidelity
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We thank members of Huang and Chen laboratories for helpful discussions. We are grateful to Dr. Tian Chi from ShanghaiTech University for excellent language editing. This work was supported by the National Key R&D Program2017YFC1001903, 2016YFC0905901;the National Science Foundation of China31471400, 39870046, 81270605, 30971066,81470324;Major technological innovation plan of hospitalSWH2016ZDCX1003, SWH2016ZDCX1010
2018-10-10(万方平台首次上网日期,不代表论文的发表时间)
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