Angular dependence of nanoparticle generation in the matrix assembly duster source
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We thank the EPSRC,the Leverhulme Trust,Innovate UK and the EU H2020 project CritCat ;for their financial support.Research performed at the University of Helsinki was supported by the EU project M4F ;The authors are also grateful to the Finnish IT Centre of Science,CSC,for grants of computational time.The MACS concept is the subject of the following patent applications:Palmer,R.E;PCT Patent Application ;Europe Patent Application ;China Patent Application ;Japan Patent Application ;U.S.Patent Application
2020-05-12(万方平台首次上网日期,不代表论文的发表时间)
共6页
3069-3074