Large-area patterning of substrate-conformal MoS2 nano-trenches
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This research was partially funded by the MIUR under the PRIN 2015 Grant No.2015WTW7J3.Authors acknowledge M.Alia CNR-IMMfor technical support and ST SMART POWER R&D Team in Agrate for substrate patterning
2019-12-04(万方平台首次上网日期,不代表论文的发表时间)
共4页
1851-1854