Deep-elliptical-silver-nanowell arrays (d-EAgNWAs) fabricated by stretchable imprinting combining colloidal lithography: A highly sensitive plasmonic sensing platform
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This work was financially supported by the National Natural Science Foundation of China51433003;the National Key Research and Development Program of China2016YFB0401701;JLU Science and Technology Innovative Research Team 2017TD-06
2019-05-27(万方平台首次上网日期,不代表论文的发表时间)
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845-853