The effect of discharge conditions of ICP etching reactor on plasma parameters
reactor、electron density、electron temperature、simulation results、linear relationship、different、three dimensional、currents、power、plasma etching、coil、experiment、comparison、decreases、study、made
25
O3(力学)
2010-03-30(万方平台首次上网日期,不代表论文的发表时间)
769-776