Chemical Mechanical Polishing of Glass Substrate with α-Alumina-g-Polystyrene Sulfonic Acid Composite Abrasive

机标关键词：Glass Substrate、Mechanical Polishing、chemical mechanical polishing、composite particles、surface defects、glass substrate、Al2O3、scanning electron microscopy、Atomic force microscopy、infrared spectroscopy、dispersion stability、influencing factors、mass spectroscopy、Fourier transform、during、CMP slurries、structure、research、In order、acid

所属期刊栏目：23

分类号：TB3;TG1

资助基金：National Natural Science Foundation of ChinaGrant 60773080, Grant 90923016;Innovation Program of Shanghai Municipal Education Commission, ChinaGrant 09ZZ86;Leading Academic Discipline Project of Shanghai Municipal Education Commission,ChinaGrant J50102

在线出版日期：2010-09-13（万方平台首次上网日期，不代表论文的发表时间）

页数：共6页

页码：276-281